Company Filing History:
Years Active: 2003-2005
Title: Nabil Mansour: Innovator in Capacitor Technology
Introduction
Nabil Mansour is a prominent inventor based in Colorado Springs, CO (US). He has made significant contributions to the field of capacitor technology, holding a total of 2 patents. His innovative work focuses on enhancing the performance and functionality of capacitors through advanced fabrication methods.
Latest Patents
One of Nabil Mansour's latest patents is titled "Capacitor with Stoichiometrically Adjusted Dielectric and Method of Fabricating Same." This invention involves the fabrication of a capacitor and its dielectric material by adjusting the amount of an ionic conductive species, such as hydrogen. This adjustment is crucial for obtaining predetermined electrical or functional characteristics. The dielectric material is formed from silicon, nitrogen, and hydrogen, allowing for stoichiometric ratio control to limit the amount of hydrogen. The capacitor is formed using dielectric material plasma enhanced chemical vapor deposition (PECVD), which enables the breaking of hydrogen bonds through ionic bombardment. This process allows for precise stoichiometric control by regulating the power of the PECVD. Additionally, applying a predetermined number of thermal cycles of temperature elevation and reduction further breaks the hydrogen bonds, controlling the amount of hydrogen in the formed capacitor dielectric material.
Career Highlights
Nabil Mansour is currently employed at LSI Logic Corporation, where he continues to innovate in the field of capacitor technology. His work has been instrumental in advancing the capabilities of capacitors, making them more efficient and effective for various applications.
Collaborations
Throughout his career, Nabil has collaborated with notable coworkers, including Derryl D J Allman and Ponce Saopraseuth. These collaborations have contributed to the development of cutting-edge technologies in the capacitor domain.
Conclusion
Nabil Mansour's contributions to capacitor technology through his innovative patents and work at LSI Logic Corporation highlight his role as a key inventor in this field. His advancements in stoichiometric control and fabrication methods are paving the way for future developments in capacitor performance.
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