Changwon, South Korea

Na Youn Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hanwha Precision Machinery Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Na Youn Lee. Retrieved from https://idiyas.com/inventor/na-youn-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Na Youn Lee: Innovator in Light Emitting Device Technology

Introduction

Na Youn Lee is a prominent inventor based in Changwon, South Korea. She has made significant contributions to the field of light-emitting devices, showcasing her expertise through her innovative patent.

Latest Patents

Na Youn Lee holds a patent for a "Device and method for determining ranks of light emitting devices each mounted on plurality of respective mounting points on substrate." This invention provides a method for determining the ranks of light-emitting devices mounted at various points on a substrate. The process involves obtaining the size of a block that includes at least one mounting point, determining the number of rank types, and arranging block groups at the mounting points. This method enhances the efficiency and effectiveness of light-emitting devices in various applications.

Career Highlights

Na Youn Lee is currently employed at Hanwha Precision Machinery Co., Ltd. Her work at this esteemed company has allowed her to further develop her skills and contribute to advancements in technology.

Collaborations

Some of her notable coworkers include Jong Il Park and Jong Eok Ban, who have collaborated with her on various projects within the company.

Conclusion

Na Youn Lee's innovative work in the field of light-emitting devices exemplifies her dedication to advancing technology. Her contributions are significant and continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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