This inventor holds 1 USPTO granted patent. Top assignee: Nesscap Co., Ltd.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Na Ri Shin - Innovator in Electric Double-Layer Devices
Introduction
Na Ri Shin is a notable inventor based in Hwasung-si, South Korea. He has made significant contributions to the field of electric double-layer devices. His innovative work has led to the development of a unique patent that enhances the lifespan of these devices.
Latest Patents
Na Ri Shin holds a patent for an electric double-layer device. This device includes a urethane potting unit designed to fill the gaps between the terminals and their respective through holes. The aluminum terminals are anodized to form an aluminum oxide film, which significantly increases the lifespan of the device. He has 1 patent to his name.
Career Highlights
Na Ri Shin is currently employed at Nesscap Co., Ltd., where he continues to work on advancements in energy storage technologies. His expertise in electric double-layer devices has positioned him as a key player in the industry.
Collaborations
Na Ri Shin collaborates with talented individuals such as Sung Wook Yoo and Kyu Jeung Lee, who contribute to his innovative projects and research efforts.
Conclusion
Na Ri Shin's work in electric double-layer devices exemplifies the spirit of innovation in the field of energy storage. His contributions are paving the way for advancements that could benefit various applications in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile