Ulsan, South Korea

Myung Sin Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Standardgraphene Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Myung Sin Lee. Retrieved from https://idiyas.com/inventor/myung-sin-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Myung Sin Lee: Innovator in Graphite Oxide Production

Introduction

Myung Sin Lee is a notable inventor based in Ulsan, South Korea. He has made significant contributions to the field of materials science, particularly in the production of graphite oxide. His innovative methods and apparatus have the potential to impact various industries.

Latest Patents

Myung Sin Lee holds a patent for a "Method for manufacturing graphite oxide and apparatus therefor." This patent outlines a novel approach to producing graphite oxide, which is essential for various applications in electronics and energy storage.

Career Highlights

Lee is currently associated with Standardgraphene Co., Ltd., where he continues to develop and refine his inventions. His work has garnered attention for its practical applications and innovative techniques.

Collaborations

He collaborates with talented individuals such as Sang Jin Hong and Sung Hun Eom, contributing to a dynamic research environment that fosters innovation.

Conclusion

Myung Sin Lee's contributions to the field of graphite oxide production exemplify the spirit of innovation. His work not only advances scientific knowledge but also holds promise for future technological developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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