Asan, South Korea

Myung Jun Lee

This inventor holds 1 USPTO granted patent. Top assignee: Duk San Neolux Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Myung Jun Lee. Retrieved from https://idiyas.com/inventor/myung-jun-lee-8qdx0hna

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Myung Jun Lee: Innovator in Photosensitive Resin Technology

Introduction

Myung Jun Lee is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. His innovative work has led to advancements in adhesion and light-blocking technologies.

Latest Patents

One of Myung Jun Lee's key patents is titled "Photosensitive resin composition having improved adhesiveness or adhesion and light blocking layer using same." This patent describes a photosensitive resin composition that includes a cardo-based resin, a reactive unsaturated compound, a pigment, an initiator, and a solvent. The invention aims to provide a light-blocking layer that exhibits enhanced adhesiveness or adhesion, showcasing the potential for improved performance in various applications.

Career Highlights

Myung Jun Lee is currently associated with Duk San Neolux Co., Ltd., where he continues to push the boundaries of innovation in his field. His work has garnered attention for its practical applications and contributions to the industry.

Collaborations

Throughout his career, Myung Jun Lee has collaborated with talented individuals such as Jun Bae and Soung Yun Mun. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Myung Jun Lee's contributions to the field of photosensitive resin technology exemplify the spirit of innovation. His work not only enhances existing technologies but also paves the way for future advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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