Company Filing History:
Years Active: 2009-2015
Title: Myun-Kyu Park: Innovator in Resist Stripping Solutions
Introduction
Myun-Kyu Park is a notable inventor based in Iksan-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of resist stripping solutions. With a total of 3 patents to his name, Park's work has had a considerable impact on the semiconductor industry.
Latest Patents
One of Park's latest patents is a resist stripping solution composition and method for stripping resist using the same. This innovative solution is highly effective in removing resist patterns and etching residues after both dry and wet etching processes. It demonstrates excellent anticorrosive effects on metal wiring, including aluminum and copper, due to the use of a specific polyol compound. Additionally, it can process various substrates thanks to a predetermined amide compound, significantly reducing costs for manufacturers.
Another important patent by Park is a composition for removing insulation materials and related methods. This composition includes about 1 to 50 percent by weight of an oxidizing agent, 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material can consist of low-k materials and protection materials, showcasing Park's versatility in addressing different challenges in the industry.
Career Highlights
Throughout his career, Myun-Kyu Park has worked with prominent companies such as Dongwoo Fine-chem Co., Ltd. and Samsung Electronics Co., Ltd. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking innovations in the field.
Collaborations
Park has collaborated with notable colleagues, including Chun-Deuk Lee and Jung-Jea Myung. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Myun-Kyu Park is a distinguished inventor whose work in resist stripping solutions has made a significant impact on the semiconductor industry. His innovative patents and collaborations highlight his commitment to advancing technology and improving manufacturing processes.