Samsung Electronics Co., Ltd.

Dongwoo Fine-Chem Co., Ltd.

Myun-Kyu Park

Dong-Min Kang

Masayuki Takashima

Young-Nam Kim

Hyun-joon Kim

Chun-Deuk Lee

Jung-Jea Myung

Byoung-Woo Son

Seung-Yong Lee

Tae-Hee Kim

Jeong-Hyun Kim

Byoung-Mook Kim

Disclosed is a resist stripping solution composition, which is highly capable of removing a resist pattern and an etching residue after dry etching or wet etching, manifests excellent anticorrosive effects on metal wiring including aluminum and/or copper because a predetermined polyol compound is used, and also can process a number of substrates because a predetermined amide compound is used, thus greatly contributing to reducing the cost. A method of stripping a resist using the resist stripping solution composition is also provided.

Resist stripping solution composition, and method for stripping resist by using same

A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.

Composition for removing an insulation material and related methods

Growing community of inventors

Iksan-si, South Korea

Myun-Kyu Park