Myeong Gyoon Chae

Title: Myeong Gyoon Chae - Innovator in Semiconductor Technology

Introduction

Myeong Gyoon Chae is an inventor based in Suwon-si, South Korea. He is recognized for his contributions to the field of semiconductor devices. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Myeong Gyoon Chae has submitted several patent applications related to semiconductor devices. One of his applications describes a semiconductor device that includes a substrate with a first surface and a second surface. It features a first source/drain pattern and a second source/drain pattern, both disposed on the first surface of the substrate. Additionally, it includes a first source/drain contact connected to the first source/drain pattern and a second source/drain contact connected to the second source/drain pattern. The design also incorporates a rear wiring line on the second surface of the substrate, along with contact connection vias and an air gap structure between them.

Another application outlines a semiconductor device that consists of a substrate with an active pattern extending horizontally. This device includes a field insulating layer surrounding the active pattern, a first gate electrode, and a source/drain region on at least one side of the gate electrode. It also features an upper interlayer insulating layer, a through via, and a source/drain contact connected to the source/drain region. The connection portion within the upper interlayer insulating layer connects both the through via and the source/drain contact, showcasing a design where the width of the connection portion exceeds that of the source/drain contact.

Conclusion

Myeong Gyoon Chae is an emerging inventor in the semiconductor field, with innovative applications that could significantly impact technology. His work reflects a commitment to advancing semiconductor device design and functionality.