Singapore, Singapore

Mustafa Eginligil

This inventor holds 1 USPTO granted patent. Top assignee: Nanyang Technological University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mustafa Eginligil. Retrieved from https://idiyas.com/inventor/mustafa-eginligil

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mustafa Eginligil: Inventor in Spin-Transport Technology.

Introduction

Mustafa Eginligil is an inventor associated with Nanyang Technological University in Singapore. His patent work concerns a topological-insulator layer designed to influence spin transport.

Latest Patents

Eginligil is associated with 1 patent. The patent describes a layer containing a topological insulator and an arrangement of surface patterns, each with at least one non-straight elongated portion. It also describes an electronic device with first and second electrodes that provide electrical connections to the layer. The disclosed method applies circularly polarized light to the layer and uses the resulting photocurrent to drive an electronic component.

Career Highlights

The patent links Eginligil’s work with research into topological insulators, patterned materials, and light-driven electronic devices. These concepts offer a way to control spin transport through a layer using circularly polarized light.

Collaborations

Eginligil’s listed coworkers include Cesare Soci and Giorgio Adamo. His association with Nanyang Technological University places this work within a university research setting.

Conclusion

Mustafa Eginligil’s patent describes a patterned topological-insulator layer and a photocurrent-based approach to controlling spin transport, highlighting his contribution to research on electronic materials and devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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