Murray Height

Title: Innovations of Murray Height in Porous Graphene Membranes

Introduction

Murray Height is an accomplished inventor based in Newtown, Australia. He has made significant contributions to the field of materials science, particularly in the development of porous graphene membranes. With a total of 3 patents to his name, Height's work is paving the way for advancements in various applications.

Latest Patents

One of his latest patents is a method for making porous graphene membranes. This innovative method involves creating a porous graphene layer with a thickness of less than 100 nm. The process includes providing a catalytically active substrate, which is a copper-nickel alloy, and utilizing chemical vapor deposition to form the porous graphene layer. The substrate is designed with catalytically inactive domains that correspond to the size of the pores in the resultant layer. Another patent focuses on a similar method for producing porous graphene layers with pores ranging from 5-900 nm, emphasizing the importance of the catalytically inactive domains in the formation process.

Career Highlights

Throughout his career, Murray Height has worked with notable companies such as Heiq Materials AG and ETH Zurich. His experience in these organizations has contributed to his expertise in the field of graphene technology and materials science.

Collaborations

Murray has collaborated with several professionals in his field, including Kyoungjun Choi and Helmut Sieber. These collaborations have further enhanced his research and development efforts in porous graphene membranes.

Conclusion

Murray Height's innovative work in the development of porous graphene membranes showcases his expertise and dedication to advancing materials science. His patents and collaborations reflect his significant contributions to the field, making him a noteworthy inventor in the industry.