This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Company. Active years: 1982.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1982
Title: Mung Chen - Innovator in Photoresist Technology
Introduction
Mung Chen is a notable inventor based in Los Altos, CO (US). He has made significant contributions to the field of photoresist technology, particularly through his innovative patent. His work has implications for various applications in the electronics and materials science industries.
Latest Patents
Mung Chen holds a patent for a "Multilayer photoresist process utilizing an absorbant dye." This patent presents an improved photoetch technique of the portable-conformable-mask type. In this process, a thin top layer of resist and a thick planarizing layer are deposited on a substrate. The thin layer is then exposed and developed to produce a portable-conformable-mask. The improvement involves dissolving a suitable dye in a layer between the thin top layer and the substrate. The dye is specifically chosen to absorb light at the wavelengths used to expose the top layer, while not interfering with the processing of the other layers. This innovation enhances the efficiency and effectiveness of the photoetching process.
Career Highlights
Mung Chen has had a distinguished career, primarily working with Hewlett-Packard Company. His role at the company has allowed him to explore and develop advanced technologies in the field of photoresist processes. His contributions have been instrumental in pushing the boundaries of what is possible in this area of research.
Collaborations
Mung Chen has collaborated with several talented individuals throughout his career. Notable coworkers include William R. Trutna, Jr. and Michael P. Watts. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Mung Chen's work in photoresist technology exemplifies the spirit of innovation and dedication to advancing scientific knowledge. His patent for the multilayer photoresist process showcases his ability to solve complex problems in the industry. Through his career at Hewlett-Packard Company and collaborations with esteemed colleagues, he continues to make a lasting impact in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile