Muneo Tamura

Title: Muneo Tamura: Innovator in Semiconductor Technology

Introduction

Muneo Tamura is a notable inventor based in Kariya, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Tamura's work has had a considerable impact on the industry.

Latest Patents

Tamura's latest patents focus on methods of fabricating semiconductor devices that utilize silicon nitride films. One of his patents describes a semiconductor device that includes a semiconductor element covered by a silicon nitride film. This film is composed of Si.sub.X N.sub.Y H.sub.Z, where X, Y, and Z represent the atomic fractions of silicon, nitrogen, and hydrogen, respectively. The silicon nitride film is designed to have an optical absorption edge wavelength shorter than 254 nm. Additionally, the mean area of regions surrounded by crystal-like grain boundaries at the surface of the silicon nitride film is equal to 4.5.times.10.sup.4 nm.sup.2 or more. The semiconductor element may also include a memory element that can have its information erased by exposure to ultraviolet rays.

Career Highlights

Muneo Tamura is currently employed at Nippondenso Co., Ltd., where he continues to advance semiconductor technology. His work has been instrumental in developing devices that enhance performance and efficiency in various applications.

Collaborations

Tamura has collaborated with notable coworkers, including Takeshi Yamauchi and Katuhide Niwa. Their combined expertise has contributed to the successful development of innovative semiconductor solutions.

Conclusion

Muneo Tamura's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.