Grenoble, France

Mrinal K Bera

This inventor holds 1 USPTO granted patent. Top assignee: Uchicago Argonne, LLC. Active years: 2017.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Mrinal K Bera: Innovator in TMDC Monolayer Fabrication

Introduction

Mrinal K Bera is an accomplished inventor based in Grenoble, France, known for her significant contributions to the field of material science. With a focus on the fabrication of transition metal dichalcogenide (TMDC) monolayers, her innovative approach promises to enhance the capabilities of these materials in various applications.

Latest Patents

Mrinal holds a patent titled "Methods for top-down fabrication of wafer scale TMDC monolayers." This groundbreaking method involves providing a multi-layer TMDC film, which consists of several layers of the TMDC. In this method, the multi-layer TMDC film is positioned on a conducting substrate. By contacting the substrate with an electrolyte solution and applying a predetermined electrode potential for a specified duration, she successfully removes a portion of the TMDC layers. As a result, a TMDC monolayer film is left on the conducting substrate, showcasing her innovative technique for producing high-quality monolayers.

Career Highlights

Mrinal is currently associated with UChicago Argonne LLC, where she applies her research expertise to advance innovative technologies. Her work has garnered attention due to its potential impact on the field of nanotechnology and materials science, highlighting her significant role in developing new materials that can lead to future technological breakthroughs.

Collaborations

In her professional journey, Mrinal has collaborated with notable colleagues, including Saptarshi Das and Andreas Roelofs. These collaborations have fostered a dynamic research environment and have been integral to the advancement of her patented technology, enabling the sharing of knowledge and innovation.

Conclusion

Mrinal K Bera represents a new wave of inventors making substantial contributions to material science. With her innovative methods for creating TMDC monolayers, she is well-positioned to influence future research and applications in nanotechnology. Her collaboration with esteemed colleagues amplifies her impact in the field, making her a significant figure to watch in the realm of scientific innovation.

Profile summary based on public USPTO records.
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