Aichi, Japan

Motoshige Isobe

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignees: Kabushiki Kaisha Toyota Jidoshokki, Tokyo University of Science Foundation. Active years: 2026.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Motoshige Isobe: Innovator in Coating Technology

Introduction

Motoshige Isobe is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of coating technology, particularly through his innovative patent.

Latest Patents

Motoshige Isobe holds a patent for a coating agent, resin member, and production method therefor. This coating agent features a film-forming component that includes an organosilicon compound with a radical polymerizable functional group and an alkoxysilyl group. Additionally, it contains a film-curing component designed to generate a base and a radical upon ultraviolet light irradiation. Notably, the film-curing component incorporates a nonionic photobase generator, which lacks ionic bonds in its molecular structure. The content of this nonionic photobase generator ranges from 0.1 parts by mass to 50 parts by mass, based on 100 parts by mass of the organosilicon compound. Motoshige Isobe has 1 patent to his name.

Career Highlights

Throughout his career, Motoshige Isobe has worked with esteemed organizations, including the Tokyo University of Science Foundation and Toyota Jidoshokki Co., Ltd. His work has significantly impacted the development of advanced coating technologies.

Collaborations

Motoshige Isobe has collaborated with notable colleagues such as Hidenori Munekata and Koji Arimitsu. Their combined expertise has contributed to the advancement of innovative solutions in their field.

Conclusion

Motoshige Isobe's contributions to coating technology through his patent demonstrate his innovative spirit and dedication to advancing the industry. His work continues to influence the development of new materials and applications.

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