This inventor holds 2 USPTO granted patents. Top assignee: Panasonic Intellectual Property Management Co., Ltd.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Motoko Hara: Innovator in Plasma Processing Technology
Introduction
Motoko Hara is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of plasma processing technology. With a total of 2 patents, her work has advanced the capabilities of plasma processing apparatuses.
Latest Patents
Hara's latest patents include innovative designs for plasma processing apparatuses and methods. One of her patents describes a plasma processing apparatus that features a base with an electrode body. This apparatus includes a seat surface for setting a substrate held on a conveying carrier. The design incorporates a lid that can be moved up and down relative to the base, allowing for the generation of plasma within a closed space. This process is essential for effective plasma processing of the substrate. Another patent outlines a similar apparatus, emphasizing the importance of a sealed space for performing plasma processing on the substrate. The integration of a guide around the electrode body further enhances the functionality of the apparatus.
Career Highlights
Motoko Hara is associated with Panasonic Intellectual Property Management Co., Ltd. Her work at this company has been instrumental in developing advanced plasma processing technologies. Hara's innovative designs have positioned her as a key figure in her field.
Collaborations
Hara collaborates with Tetsuhiro Iwai, contributing to the advancement of plasma processing technologies. Their partnership has fostered innovation and development in this specialized area.
Conclusion
Motoko Hara's contributions to plasma processing technology through her patents and collaborations highlight her role as a leading inventor in the field. Her work continues to influence advancements in plasma processing applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile