Saitama, Japan

Motohiko Maene

This inventor holds 1 USPTO granted patent. Top assignee: Enplas Corporation. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Motohiko Maene. Retrieved from https://idiyas.com/inventor/motohiko-maene

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Motohiko Maene: Innovator in Optical Technology

Introduction

Motohiko Maene is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of optical technology, particularly through his innovative designs and patents. His work has implications for various applications in the optical industry.

Latest Patents

Motohiko Maene holds a patent for an "Optical receptacle, optical module, and method for manufacturing optical module." This invention features an optical receptacle that includes a first optical element and a second optical element. These elements are coupled through a fitting mechanism, enhancing the functionality and efficiency of optical modules.

Career Highlights

Maene is associated with Enplas Corporation, where he has been instrumental in advancing optical technologies. His expertise and innovative mindset have led to the development of cutting-edge optical solutions that benefit the industry.

Collaborations

Throughout his career, Motohiko Maene has collaborated with talented individuals such as Shimpei Morioka and Ayano Kon. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Motohiko Maene's contributions to optical technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in optical modules and receptacles.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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