Netanya, Israel

Moshe Vaige

This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moshe Vaige. Retrieved from https://idiyas.com/inventor/moshe-vaige

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: The Innovations of Moshe Vaige

Introduction

Moshe Vaige is a notable inventor based in Netanya, Israel. He has made significant contributions to the field of power measurement technology. His innovative approach has led to the development of a unique device that enhances the accuracy and efficiency of power display systems.

Latest Patents

Moshe Vaige holds a patent for a device titled "Forward and Reflected Power Measurement and Display." This invention allows for the simultaneous display of forward and reflected power values. The device features a plurality of display segments that are activated in a predetermined sequence to show forward power and deactivated in a specific order to indicate reflected power. This innovation simplifies the monitoring process for users.

Career Highlights

Vaige is currently employed at Motorola Corporation, where he continues to work on advancements in technology. His role at the company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Areyh Vered and Reich Shmuel. Their combined expertise contributes to the innovative environment at Motorola Corporation.

Conclusion

Moshe Vaige's contributions to power measurement technology exemplify the spirit of innovation. His patent reflects a commitment to enhancing user experience in power display systems. His work at Motorola Corporation continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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