This inventor holds 10 USPTO granted patents and 2 published patent applications. Top assignees: Olin Corporation, Olin Corporaton. Active years: 1989-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989-2016
Title: The Innovative Contributions of Morris C. Buenemann, Jr.
Introduction
Morris C. Buenemann, Jr. is a notable inventor based in Florissant, MO (US), recognized for his significant contributions to the field of ammunition technology. With a total of 10 patents to his name, he has made strides in developing innovative solutions that enhance the performance and safety of firearms.
Latest Patents
Among his latest patents is the "Shotshell with combination slug and shot load," which presents an improved design for shotshells. This innovation features a hull containing a propellant, a wad, and a load that includes at least one non-spherical slug and shot, with the shot positioned in front of the slug. Another significant patent is the "Lead-free tin projectile," which offers a lead-free alternative suitable for use as a bullet or slug. This projectile core is made from high purity tin, providing deformation properties similar to lead-based projectiles while eliminating the environmental hazards associated with lead.
Career Highlights
Morris has had a distinguished career, working with prominent companies such as Olin Corporation. His work has focused on creating safer and more effective ammunition, reflecting his commitment to innovation in this critical field.
Collaborations
Throughout his career, Morris has collaborated with talented individuals, including Keith E. Enlow and Robert J. Gardner. These partnerships have contributed to the development of his groundbreaking inventions.
Conclusion
Morris C. Buenemann, Jr. stands out as an influential inventor in the ammunition industry, with a portfolio of patents that showcases his dedication to innovation and safety. His contributions continue to impact the field positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile