Suyama Susono, Japan

Morohisa Tamura

This inventor holds 1 USPTO granted patent. Top assignee: Nihon Shinku Gijutsu Kabushiki Kaisha. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Morohisa Tamura. Retrieved from https://idiyas.com/inventor/morohisa-tamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Morohisa Tamura: Innovator in Sputtering Technology

Introduction

Morohisa Tamura is a notable inventor based in Suyama Susono, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent. His work has implications for various applications in materials science and engineering.

Latest Patents

Morohisa Tamura holds a patent for a "Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly." This invention features a sputtering apparatus that includes a vacuum housing, a substrate holder for holding a substrate, and a composite sputtering cathode assembly. The assembly consists of multiple targets and shields positioned between them. This design ensures that only sputtering particles directed perpendicularly to the substrate reach it, allowing for a uniform film thickness when the substrate and targets rotate relative to each other. He has 1 patent to his name.

Career Highlights

Tamura's career is marked by his dedication to advancing sputtering technology. His innovative approach has led to improvements in the efficiency and effectiveness of sputtering processes. He is associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he continues to contribute to the field.

Collaborations

Throughout his career, Morohisa Tamura has worked alongside talented individuals such as Hisaharu Obinata and Yasushi Higuchi. Their collaborative efforts have furthered advancements in sputtering technology and related fields.

Conclusion

Morohisa Tamura's contributions to sputtering technology through his innovative patent demonstrate his expertise and commitment to the field. His work continues to influence advancements in materials science and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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