This inventor holds 1 USPTO granted patent. Top assignee: Nihon Shinku Gijutsu Kabushiki Kaisha. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Morohisa Tamura: Innovator in Sputtering Technology
Introduction
Morohisa Tamura is a notable inventor based in Suyama Susono, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent. His work has implications for various applications in materials science and engineering.
Latest Patents
Morohisa Tamura holds a patent for a "Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly." This invention features a sputtering apparatus that includes a vacuum housing, a substrate holder for holding a substrate, and a composite sputtering cathode assembly. The assembly consists of multiple targets and shields positioned between them. This design ensures that only sputtering particles directed perpendicularly to the substrate reach it, allowing for a uniform film thickness when the substrate and targets rotate relative to each other. He has 1 patent to his name.
Career Highlights
Tamura's career is marked by his dedication to advancing sputtering technology. His innovative approach has led to improvements in the efficiency and effectiveness of sputtering processes. He is associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he continues to contribute to the field.
Collaborations
Throughout his career, Morohisa Tamura has worked alongside talented individuals such as Hisaharu Obinata and Yasushi Higuchi. Their collaborative efforts have furthered advancements in sputtering technology and related fields.
Conclusion
Morohisa Tamura's contributions to sputtering technology through his innovative patent demonstrate his expertise and commitment to the field. His work continues to influence advancements in materials science and engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile