Kakogawa, Japan

Moriyasu Matsuda

This inventor holds 1 USPTO granted patent. Top assignee: Seitetsu Kagaku Co., Ltd.. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moriyasu Matsuda. Retrieved from https://idiyas.com/inventor/moriyasu-matsuda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: Moriyasu Matsuda: Innovator in Chemical Processes

Introduction

Moriyasu Matsuda is a notable inventor based in Kakogawa, Japan. He has made significant contributions to the field of chemical engineering, particularly in the chlorination of xylenols. His innovative approach has led to advancements in the production of industrially useful xylenols.

Latest Patents

Matsuda holds a patent for a process for chlorinating xylenols. This process involves the chlorination of xylenols with a chlorinating agent such as sulfuryl chloride, in the presence of a metal chloride catalyst. The method further includes the use of 0.001 to 1% by weight of a sulfur compound, based on the xylenols. This innovative technique allows for the safe production of xylenols with high selectivity and yield.

Career Highlights

Matsuda is associated with Seitetsu Kagaku Co., Ltd., where he has been able to apply his expertise in chemical processes. His work has contributed to the company's reputation in the chemical industry.

Collaborations

Matsuda has collaborated with notable colleagues such as Teiziro Matsumoto and Katsuma Hatta. Their combined efforts have fostered a productive environment for innovation and development in their field.

Conclusion

Moriyasu Matsuda's contributions to the chlorination of xylenols exemplify the impact of innovative thinking in chemical engineering. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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