Company Filing History:
Years Active: 2016
Title: Morgan C Putnam: Innovator in Three-Dimensional Patterning Methods
Introduction
Morgan C Putnam is a notable inventor based in Pasadena, California. He has made significant contributions to the field of microstructure patterning, particularly in semiconductor technology. His innovative work has led to the development of methods that enhance the fabrication of three-dimensional microstructures.
Latest Patents
Morgan C Putnam holds a patent for "Three-dimensional patterning methods and related devices." This patent describes methods for creating three-dimensional microstructures, such as semiconductor wire arrays. The techniques involve etching and deposition steps that are crucial for effectively patterning these complex structures.
Career Highlights
Morgan is affiliated with the California Institute of Technology, where he continues to advance research in microfabrication techniques. His work has been instrumental in pushing the boundaries of semiconductor technology, making it possible to create more efficient and compact devices.
Collaborations
Throughout his career, Morgan has collaborated with esteemed colleagues, including Michael D Kelzenberg and Harry A Atwater. These partnerships have fostered a rich environment for innovation and have contributed to the success of various research projects.
Conclusion
Morgan C Putnam's contributions to three-dimensional patterning methods have positioned him as a key figure in semiconductor research. His innovative approaches continue to influence the field and pave the way for future advancements.
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