Moreno Piselli

Title: The Innovative Contributions of Moreno Piselli

Introduction

Moreno Piselli is a notable inventor based in Milan, Italy. He has made significant contributions to the field of nanotechnology, particularly through his innovative methods for producing nanostructured thin layers. His work has implications for various applications in materials science and engineering.

Latest Patents

Moreno Piselli holds a patent for a "Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure." This patent describes a method for producing nanostructured thin layers using plasma technology. The apparatus includes a first chamber equipped with a reagent gas injector, inert gas feeding means, and an antenna for plasma creation. A second chamber is connected to a pumping system, housing the substrate on which the nanostructured film is produced. The design of the injector and antenna is optimized to ensure effective plasma interaction, enhancing the quality of the nanostructured layers.

Career Highlights

Throughout his career, Moreno Piselli has worked with various institutions, including the Università Degli Studi Di Milano-Bicocca. His research and development efforts have focused on advancing the understanding and application of nanostructured materials.

Collaborations

Moreno has collaborated with notable colleagues, including Claudia Riccardi and Francesco Sirio Fumagalli. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.

Conclusion

Moreno Piselli's innovative work in nanotechnology and his patent for depositing nanostructured thin layers highlight his contributions to the field. His research continues to influence advancements in materials science, showcasing the importance of innovation in technology.