The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Nov. 30, 2010
Claudia Riccardi, Milan, IT;
Moreno Piselli, Milan, IT;
Francesco Sirio Fumagalli, Tiano, IT;
Fabio Di Fonzo, Milan, IT;
Carlo Enrico Bottani, Milan, IT;
Claudia Riccardi, Milan, IT;
Moreno Piselli, Milan, IT;
Francesco Sirio Fumagalli, Tiano, IT;
Fabio Di Fonzo, Milan, IT;
Carlo Enrico Bottani, Milan, IT;
Other;
Abstract
A method for producing, by means of plasma, nanostructured thin layers particularly of the hierarchically organized type, and an apparatus for implementing the method, are described. At least a first chamber () is provide in which are present an injector () of a reagent gas, means (') for feeding inert gases, and an antenna () for the creation of a plasma in said first chamber. Enclosing said first chamber is a second chamber () to which a pumping system is connected, containing a housing for the substrate () on which the nanostructured film is produced. A wall () separates said first chamber from said second chamber and has at least one opening (). The injector and antenna are arranged in the first chamber with a geometry such that the distance between the outlet of said injector is at a distance of no more than 5 cm from the plane of the surface of said antenna farther from said wall, and said surface is at a distance of no more than 5 cm from said opening.