Yongin-si, South Korea

Moo-yong Park


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2007-2009

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3 patents (USPTO):Explore Patents

Title: Moo-yong Park: Innovator in Chemical Mechanical Polishing Technology

Introduction

Moo-yong Park is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Moo-yong Park's latest patents include innovative devices and methods related to chemical mechanical polishing. One of his notable inventions is a CMP device that planarizes a wafer by rotating a carrier with a mounted wafer over a rotating polishing table. This process involves supplying a slurry onto a polishing pad attached to the table. Additionally, he has developed a pad conditioner assembly that conditions the polishing pad by supplying a conditioning liquid while simultaneously applying megasonic vibrations to remove foreign substances from the pad's surface. Another significant patent involves a polishing pad designed to enhance the uniformity of material removal from semiconductor substrates, ensuring reproducibility in the CMP process.

Career Highlights

Moo-yong Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of semiconductor technology. His expertise in CMP devices has positioned him as a key player in advancing manufacturing techniques that are critical for the production of high-quality semiconductor components.

Collaborations

Moo-yong Park has collaborated with notable colleagues, including Ja-Eung Koo and Sang-cheol Han, to further enhance the development of CMP technologies. Their combined efforts have contributed to the success of various projects within the semiconductor industry.

Conclusion

Moo-yong Park's contributions to chemical mechanical polishing technology have made a significant impact on the semiconductor manufacturing process. His innovative patents and ongoing work at Samsung Electronics Co., Ltd. continue to shape the future of this critical industry.

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