Monte M Toole

Title: Monte M Toole: Innovator in Semiconductor Processing

Introduction

Monte M Toole is a notable inventor based in San Carlos, CA (US). He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent that addresses the challenges of batch processing semiconductor wafers. His work has implications for the efficiency and economic feasibility of semiconductor manufacturing.

Latest Patents

Monte M Toole holds a patent for a "Method and apparatus for batch processing a semiconductor wafer." This invention focuses on growing semiconductor quality oxide thermal layers on wafers at a speed that makes the batch process economically viable. The method utilizes high pressure and high temperature to ensure rapid processing. For instance, under conditions of 10 to 25 atmospheres of pressure and temperatures ranging from 600°C to 1100°C, it takes approximately 90 minutes to grow a 5,000 Å oxide layer on about 50 wafers in a steam environment. The system can achieve these conditions from ambient temperature in about 17 minutes, while depressurization and cooling require around 22 minutes. The apparatus features a processing chamber pressurized with an oxidant, such as high-pressure steam or oxygen, contained within a pressure vessel that can be pressurized with an inert gas like nitrogen.

Career Highlights

Monte M Toole has been associated with Gasonics, Inc., where he has applied his expertise in semiconductor technology. His work has contributed to advancements in the efficiency of semiconductor manufacturing processes.

Collaborations

Monte has collaborated with Charles A Boitnott, further enhancing the innovative capabilities within his field.

Conclusion

Monte M Toole's contributions to semiconductor processing through his patented methods demonstrate his commitment to innovation in technology. His work not only advances the field but also sets a foundation for future developments in semiconductor manufacturing.