Hessen, Germany

Monir Gallouch

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ic-Haus Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Monir Gallouch. Retrieved from https://idiyas.com/inventor/monir-gallouch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Monir Gallouch: Innovator in Optical Position Encoding

Introduction

Monir Gallouch is a notable inventor based in Hessen, Germany. He has made significant contributions to the field of optical position encoding, showcasing his expertise through innovative patent developments. His work is characterized by a focus on optoelectronic components and their applications in precision measurement.

Latest Patents

Monir Gallouch holds a patent for a "Method for producing an optical position encoder." This invention involves a method that includes an optoelectronic component and a measuring scale illuminated by an LED light source. The design features a molded LED light source that exposes a light outlet surface, which is coated in certain regions to create a light outlet window. This innovative approach enhances the functionality and efficiency of optical position encoders.

Career Highlights

Monir Gallouch is associated with Ic-haus GmbH, a company known for its advancements in high-performance optoelectronic systems. His role at the company has allowed him to apply his inventive skills in developing cutting-edge technologies that meet industry demands.

Collaborations

Due to space constraints, the details of collaborations will not be included.

Conclusion

Monir Gallouch's contributions to optical position encoding through his innovative patent reflect his commitment to advancing technology in this field. His work continues to influence the development of precision measurement systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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