San Francisco, CA, United States of America

Molly Jane Fowler

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • San Francisco, CA (US) (2016 - 2020)
  • Oakland, CA (US) (2022)

Company Filing History:


Years Active: 2016-2022

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4 patents (USPTO):Explore Patents

Title: The Innovative Journey of Molly Jane Fowler

Introduction

Molly Jane Fowler is a prominent inventor based in San Francisco, CA. She has made significant contributions to the field of technology, particularly in the realm of dynamic mask applications. With a total of 4 patents to her name, her work showcases her creativity and technical expertise.

Latest Patents

Molly's latest patents include innovative methods for dynamic mask applications. One embodiment involves identifying a first user in an input image and accessing their social data from an online social network. Based on this data, a mask is selected from a set of masks, which specifies various mask effects. This mask is then applied to the input image, enhancing the user's experience by incorporating social interactions. Another embodiment focuses on identifying emotions associated with objects in input images. By selecting masks based on these emotions, Molly's method generates graphical features that are incorporated into output images, creating a more engaging visual experience.

Career Highlights

Throughout her career, Molly has worked with leading technology companies, including Facebook, Inc. and Meta Platforms, Inc. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking projects.

Collaborations

Molly has collaborated with talented individuals such as Bradley Edward Hettervik and Surendra Gadodia. These partnerships have further enriched her work and expanded her innovative capabilities.

Conclusion

Molly Jane Fowler's contributions to the field of technology through her patents and collaborations highlight her as a leading inventor. Her innovative approaches to dynamic mask applications continue to influence the industry and inspire future advancements.

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