Mokuji Kageyama

Title: Mokuji Kageyama: Innovator in Semiconductor Technology

Introduction

Mokuji Kageyama is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His innovative approaches have led to advancements in etching methods and semiconductor device manufacturing.

Latest Patents

Kageyama's latest patents include an etching method, etching apparatus, and analyzing method. This innovative process involves locally heating or cooling a substrate during etching, which helps control temperature unevenness and restricts convection currents of the etching liquid. By starting the etching process at a low temperature and gradually increasing it, uniform and rapid etching can be achieved. Additionally, in his drop etching method, he has developed a technique to prevent bubble generation, ensuring uniform etching by incorporating gas release openings in a member opposed to the substrate. Another significant patent focuses on a semiconductor device and its manufacturing method. This invention creates a denuded zone in the surface layer of a semiconductor wafer, which is less prone to defects. It also introduces micro defects for gettering impurity metals, maintaining mechanical strength while enhancing gettering performance.

Career Highlights

Kageyama is currently employed at Kabushiki Kaisha Toshiba, where he continues to innovate and contribute to the semiconductor industry. His work has been instrumental in developing technologies that improve the efficiency and reliability of semiconductor devices.

Collaborations

Throughout his career, Kageyama has collaborated with notable colleagues, including Moriya Miyashita and Ayako Maeda. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Mokuji Kageyama's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing.