Hachioji, Japan

Mituru Ohishi

This inventor holds 1 USPTO granted patent. Top assignee: Fuji Electric Co., Ltd.. Active years: 1995.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Mituru Ohishi - Innovator in Gas Analysis Technology

Introduction

Mituru Ohishi is a prominent inventor based in Hachioji, Japan. She has made significant contributions to the field of gas analysis technology. Her innovative work has led to the development of a unique patent that enhances the accuracy of gas measurement.

Latest Patents

Mituru Ohishi holds a patent for a Non-dispersive Infrared Gas Analyzer, which includes gas-filled radiation. This invention is designed to improve the linearity of output concentration signals, particularly when measuring gas species at high concentrations. The analyzer features a measuring cell for gas input, a non-selective infrared radiation sensor, an optical band-pass filter, and a nonselective infrared radiation source. The radiation source is filled with gas at a predetermined partial pressure, which shares a common molecular structure with the gas being measured. This innovative design allows for more precise gas analysis.

Career Highlights

Mituru Ohishi is currently employed at Fuji Electric Co., Ltd., where she continues to advance her research and development efforts. Her work has been instrumental in enhancing the capabilities of gas analysis technologies.

Collaborations

Mituru has collaborated with notable colleagues, including Hitoshi Okuyama and Masahiro Uno. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Mituru Ohishi's contributions to gas analysis technology exemplify her innovative spirit and dedication to improving measurement accuracy. Her patent for the Non-dispersive Infrared Gas Analyzer is a testament to her expertise and commitment to advancing the field.

Profile summary based on public USPTO records.
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