Mitsutoshi Sasaki

Title: Mitsutoshi Sasaki: Innovator in Substrate Processing Technology

Introduction

Mitsutoshi Sasaki is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His work focuses on developing advanced apparatuses and methods that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Sasaki's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus features a processing bath that stores a processing liquid in which a substrate is immersed. It includes a first lid member that covers the upper opening of the processing bath, an outer bath located outside the processing bath, and a processing liquid introduction unit that allows for the transfer of processing liquid. Additionally, the apparatus is equipped with a first gas supply unit that supplies an inert gas to the processing liquid and a second gas supply unit for the outer bath. The substrate processing method involves performing an etching process on a substrate using an etching solution that contains phosphoric acid, with a focus on varying the silicon concentration during the etching process.

Career Highlights

Mitsutoshi Sasaki is currently employed at Screen Holdings Co., Ltd., where he continues to innovate in substrate processing technologies. His expertise and dedication to research have positioned him as a key figure in his field.

Collaborations

Sasaki has collaborated with notable colleagues, including Tomohiro Takahashi and Takashi Akiyama. Their combined efforts contribute to the advancement of substrate processing technologies.

Conclusion

Mitsutoshi Sasaki's work in substrate processing technology exemplifies innovation and dedication. His patents and contributions continue to influence the industry, showcasing the importance of research and development in advancing technology.