The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2023

Filed:

Jun. 27, 2021
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Tomohiro Takahashi, Kyoto, JP;

Kei Takechi, Kyoto, JP;

Mitsutoshi Sasaki, Kyoto, JP;

Takashi Akiyama, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/677 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67086 (2013.01); H01L 21/02052 (2013.01); H01L 21/02343 (2013.01); H01L 21/302 (2013.01); H01L 21/6708 (2013.01); H01L 21/6715 (2013.01); H01L 21/67017 (2013.01); H01L 21/67253 (2013.01); H01L 21/67259 (2013.01); H01L 21/67757 (2013.01);
Abstract

A substrate processing device includes a processing tank, a substrate holding unit, a fluid supply unit, and a control unit. The processing tank stores a processing liquid for processing a substrate. The substrate holding unit holds the substrate in the processing liquid in the processing tank. The fluid supply unit supplies a fluid to the processing tank. The control unit controls the fluid supply unit. The control unit controls the fluid supply unit such that the fluid supply unit changes supply of the fluid during a period from a start of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed to an end of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed.


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