Shinnanyo, Japan

Mitsutoshi Fukuda


Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 60(Granted Patents)


Location History:

  • Nanyo, JP (1983)
  • Shin-nanyo, JP (1981 - 1985)
  • Tokuyama, JP (1987)
  • Yamaguchi, JP (1985 - 1993)

Company Filing History:


Years Active: 1981-1993

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8 patents (USPTO):Explore Patents

Title: Mitsutoshi Fukuda: Innovator in Fine Pattern Production

Introduction

Mitsutoshi Fukuda is a prominent inventor based in Shinnanyo, Japan. He has made significant contributions to the field of fine pattern production, holding a total of 8 patents. His innovative methods have advanced the capabilities of semiconductor manufacturing and micro-patterning technologies.

Latest Patents

Fukuda's latest patents include a method for producing fine patterns utilizing specific polymeric materials. This method involves spin-coating a photosensitive resin solution as an upper layer, which contains a diazonium salt as a photobleachable agent, along with water and/or an organic solvent, and a polymer. The process allows for the production of patterns smaller than 1 micrometer with high precision. Another notable patent is a method for forming micro-patterns by development, which minimizes swelling of irradiated portions of the resist film and accelerates the dissolution of non-irradiated portions, resulting in excellent edge shape quality for desired micro-patterns.

Career Highlights

Throughout his career, Fukuda has worked with notable companies such as Toyo Soda Manufacturing Co., Ltd. and Nippon Telegraph and Telephone Corporation. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor processes.

Collaborations

Fukuda has collaborated with esteemed colleagues, including Kenji Koyama and Syotaro Ohno, contributing to various advancements in the field of micro-patterning and semiconductor technology.

Conclusion

Mitsutoshi Fukuda's innovative approaches and patents have significantly impacted the semiconductor industry, showcasing his expertise and dedication to advancing technology. His contributions continue to influence the development of fine pattern production methods.

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