The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 1985

Filed:

Feb. 13, 1984
Applicant:
Inventors:

Tsuguo Yamaoka, Chiba, JP;

Mitsutoshi Fukuda, Yamaguchi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430270 ; 20415918 ; 430926 ; 430919 ; 430923 ; 430920 ;
Abstract

Photosensitive compositions useful as resists for transistors, ICs, etc. comprising a solution of a photosensitive high polymer of a polymer or a copolymer which contains a unit expressed by the following general formula: ##STR1## (where X.sub.1 is an atom of hydrogen or halogen, a halogenated alkyl group of 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms, X.sub.2 is a halogen atom or a halogenated alkyl group having 1 to 4 carbon atoms and R is an aromatic ring or a heterocyclic ring), and a photosensitizing agent dissolved in organic solvents. The photosensitive compositions show marked improvement in photosensitivity and gamma value.


Find Patent Forward Citations

Loading…