This inventor holds 1 USPTO granted patent. Top assignees: Mec International Corporation, Toyota Jidosha Kabushiki Kaisha, Other. Active years: 1997.
Company Filing History:
1 out of 7 
1 out of 38,723 
1 out of 834,350 Years Active: 1997
Title: Mitsuru Tomoto: Innovator in Metal Removal Techniques
Introduction
Mitsuru Tomoto is a notable inventor based in Toyota, Japan. He has made significant contributions to the field of metal removal techniques, particularly through his innovative patent. His work focuses on enhancing the efficiency of metal extraction from solutions, which has various applications in industrial processes.
Latest Patents
Mitsuru Tomoto holds a patent titled "Method for removing metal contained in solution using surfactant." This patent discloses a technique for removing metal from a solution through chelation. The method involves adding a surface-active agent that contains a hydrophobic group, a hydrophilic group, and a chelating group to the solution. This combination prevents undesired aggregation while allowing effective aggregation during the process. The chelating group effectively binds to the metal, while the hydrophilic group ensures stability, and the hydrophobic group facilitates aggregation. This innovative approach opens up various possibilities by selecting the charge of the ligand.
Career Highlights
Throughout his career, Mitsuru Tomoto has worked with prominent companies, including Toyota Motor Corporation and Mec International Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in metal removal.
Collaborations
Mitsuru has collaborated with notable colleagues such as Heijiro Ojima and Katsuya Murakami. Their combined expertise has contributed to advancements in the field of metal extraction and treatment.
Conclusion
Mitsuru Tomoto's contributions to the field of metal removal through innovative techniques highlight his role as a significant inventor. His patented method showcases the potential for improved industrial processes and reflects his dedication to advancing technology in this area.