Kobe, Japan

Mitsuru Ono

This inventor holds 1 USPTO granted patent. Top assignee: Sensor Technology Co., Ltd.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuru Ono. Retrieved from https://idiyas.com/inventor/mitsuru-ono-syerbdeu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Mitsuru Ono: Innovator in Safety Technology

Introduction

Mitsuru Ono is a notable inventor based in Kobe, Japan, recognized for his innovative contributions to safety technology. With a focus on enhancing occupant protection, he has secured a patent that showcases his dedication to improving safety standards in vehicles and other transport systems.

Latest Patents

Ono holds a patent for an "Actuating-judgment system for safety device for protecting occupant." This invention highlights his expertise in creating advanced systems that contribute to the well-being of individuals in potentially hazardous scenarios.

Career Highlights

Mitsuru Ono works at Sensor Technology Co., Ltd., a company known for its commitment to developing cutting-edge sensor technologies. Throughout his career, Ono has consistently demonstrated a passion for innovating solutions that safeguard users.

Collaborations

At Sensor Technology Co., Ltd., Mitsuru collaborates with talented colleagues such as Masaru Takeda and Etsujiro Imanishi. Together, they strive to advance the field of safety devices and contribute significantly to their industry.

Conclusion

In conclusion, Mitsuru Ono stands out as a key figure in the realm of safety technology. His patented innovation not only reflects his ingenuity but also emphasizes the importance of protecting individuals in various environments. As he continues his work, the impact of his contributions is sure to benefit many in the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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