Mitsuru Okuno

Title: Mitsuru Okuno: Innovator in Semiconductor Technology

Introduction

Mitsuru Okuno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the manufacturing processes and features of photomasks used in semiconductor devices.

Latest Patents

Okuno's latest patents include innovative methods and apparatuses that improve the efficiency and effectiveness of semiconductor manufacturing. One notable patent is related to a photomask that can maintain a large depth of focus, even when four main features are randomly arranged. This design allows for greater flexibility in the arrangement of features on a wafer, which is crucial for modern semiconductor fabrication. Another significant patent involves a pattern formation method using a Levenson-type mask, which optimizes exposure steps to achieve precise pattern dimensions.

Career Highlights

Throughout his career, Mitsuru Okuno has worked with leading companies in the semiconductor industry, including Renesas Electronics Corporation and Renesas Technology Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in semiconductor technology.

Collaborations

Okuno has collaborated with notable colleagues such as Akemi Moniwa and Ayumi Minamide. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the semiconductor field.

Conclusion

Mitsuru Okuno's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing.