This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2013.
Location History:
- Hitachi, JP (2013)
- Ibaraki, JP (2013)
Company Filing History:
Years Active: 2013
Title: Mitsuru Ishi: Innovator in Photosensitive Resin Technology
Introduction
Mitsuru Ishi is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of photosensitive resin technology. With a total of 2 patents to his name, Ishi's work has advanced the methods used in manufacturing printed wiring boards.
Latest Patents
Ishi's latest patents include a photosensitive resin composition and methods for forming resist patterns. The first patent describes a photosensitive resin composition that comprises a binder polymer, a photopolymerizing compound with ethylenic unsaturated bonds, a photopolymerization initiator, and a polymerization inhibitor. The content of the polymerization inhibitor is specified to be between 20-100 ppm by mass based on the total solid content of the composition. The second patent also focuses on a similar composition but highlights the use of an acridine compound as the photopolymerization initiator.
Career Highlights
Mitsuru Ishi is currently employed at Hitachi Chemical Company, Ltd. His work at this esteemed organization has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of his notable coworkers include Junichi Iso and Yoshiki Ajioka. Their collective expertise has contributed to the innovative advancements in photosensitive resin technology.
Conclusion
Mitsuru Ishi's contributions to the field of photosensitive resin technology are noteworthy. His patents reflect a commitment to innovation and improvement in manufacturing processes. His work continues to influence the industry positively.