This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 1991.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991
Title: Mitsuo Samezawa: Innovator in Plasma Treatment Technology
Introduction
Mitsuo Samezawa is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of plasma treatment technology, particularly in the development of electrodes used in semiconductor manufacturing. With a total of 2 patents to his name, Samezawa's work has had a meaningful impact on the industry.
Latest Patents
Samezawa's latest patents focus on an innovative electrode designed for the treatment of objects, such as semiconductor wafers, through plasma reactions. This electrode features a surface layer made of silicon carbide, which is formed on a base using a chemical vapor deposition (CVD) coating process. This advancement enhances the efficiency and effectiveness of plasma treatment in semiconductor applications.
Career Highlights
Mitsuo Samezawa is currently associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its expertise in chemical products and materials for the semiconductor industry. His work at the company has allowed him to push the boundaries of technology in plasma treatment.
Collaborations
Samezawa has collaborated with esteemed colleagues, including Isamu Hijikata and Akira Uehara. These partnerships have fostered innovation and contributed to the advancement of their shared field.
Conclusion
Mitsuo Samezawa's contributions to plasma treatment technology exemplify the importance of innovation in the semiconductor industry. His patents and collaborations reflect a commitment to advancing technology and improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile