Mitsuo Matsumura

Title: **Mitsuo Matsumura: Innovator in Silicon and Carbon Film Technologies**

Introduction

Mitsuo Matsumura, an esteemed inventor based in Kasukabe, Japan, has made significant contributions to the field of materials science through his innovative work in the development of silicon and carbon films. With a total of four patents to his name, Matsumura's research has paved the way for advanced applications in various industries, showcasing his expertise and commitment to innovation.

Latest Patents

Matsumura's latest patents demonstrate his focus on enhancing film technologies. One of his notable inventions is a **Silicon Thin Film and Method of Producing the Same**. This invention details a silicon thin film primarily made up of silicon atoms, supplemented by hydrogen and halogens such as fluorine, chlorine, bromine, and iodine. The production method involves deposition in a plasma atmosphere utilizing silane or halogenated silane as raw materials. The novel approach allows for the creation of mixed crystalline and amorphous substances by controlling the film deposition rate through specific gas ratios and plasma discharge power densities.

Another significant patent is the **Method of Synthesizing Carbon Film and Carbon Particles in a Vapor Phase**. This innovative technique utilizes a single or mixed gas that supplies halogen, hydrogen, and carbon atoms, resulting in carbon films with enhanced properties. By incorporating halogen radicals, particularly chlorine and fluorine, Matsumura's method effectively suppresses carbon atom desorption, allowing for the easy production of high-quality diamond films.

Career Highlights

Matsumura's career spans years of dedicated research and development in materials technology. His work has attracted attention within the academic and industrial sectors, highlighting his role as a key player in advancing film synthesis methodologies. As an employee of Toa Nenryo Kogyo Co., Ltd., Matsumura has applied his knowledge and skills to drive innovation within the company.

Collaborations

Throughout his career, Matsumura has collaborated with esteemed colleagues, including Toshihiko Yoshida and Hideo Yamamoto. These partnerships have contributed to the exchange of ideas and expertise, further advancing the field and leading to the successful realization of groundbreaking patents.

Conclusion

Mitsuo Matsumura's innovative contributions in the domain of silicon and carbon films not only reflect his technical prowess but also his dedication to advancing material science. Through his patents and collaborative efforts, he continues to inspire the next generation of inventors and researchers in the pursuit of cutting-edge technologies.