Yokohama, Japan

Mitsunori Numata


Average Co-Inventor Count = 3.9

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Kanagawa, JP (2017)
  • Yokohama, JP (2016 - 2023)

Company Filing History:


Years Active: 2016-2025

Loading Chart...
7 patents (USPTO):Explore Patents

Title: Innovations by Mitsunori Numata

Introduction

Mitsunori Numata is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of technology, particularly in the development of advanced inspection devices and measurement apparatuses. With a total of 7 patents to his name, Numata continues to push the boundaries of innovation.

Latest Patents

One of his latest inventions is an inspection device designed to improve the accuracy characteristics of Magnetoresistive Random Access Memory (MRAM). This device includes a stage on which a MRAM element is fixed, along with electromagnets that generate a first magnetic field. The magnetic field can change direction based on the position on the stage, enhancing the precision of the inspection process. Another notable patent is the pupil ellipsometry measurement apparatus, which is configured to measure objects with high accuracy. This apparatus features a light source unit, an irradiation optical system, and multiple detectors to capture and analyze reflected light, ultimately reconstructing reflectance information.

Career Highlights

Mitsunori Numata is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop cutting-edge technologies. His work has significantly impacted the field of semiconductor devices and measurement techniques.

Collaborations

Numata has collaborated with notable colleagues, including Yasuhiro Hidaka and Mitsuhiro Togashi. Their combined expertise has contributed to the advancement of various technological innovations.

Conclusion

Mitsunori Numata's contributions to technology through his patents and collaborations highlight his role as a leading inventor in the industry. His work continues to influence the development of advanced measurement and inspection technologies.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…