Mitsumasa Kunishi

Title: Mitsumasa Kunishi: Innovator in Semiconductor Technology

Introduction

Mitsumasa Kunishi is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of semiconductor technology. His innovative work has led to the development of a unique resist utilized in the manufacturing of semiconductor elements.

Latest Patents

Mitsumasa Kunishi holds a patent for a resist and method of manufacturing semiconductor elements. The patent describes a resist that comprises a copolymer of 2,3 dibromo-n-propyl methacrylate and methylmethacrylate. This resist is applied onto a substrate to form a copolymer resist layer. The layer is then irradiated with ionizing radiations, allowing the irradiated portions to be dissolved and form a positive pattern. The positive pattern undergoes a heating process in an inert atmosphere to initiate a crosslinking reaction of reactive radicals remaining in the copolymer resist. Finally, the assembly is etched with a liquid etchant to create an etched pattern on the substrate.

Career Highlights

Mitsumasa Kunishi is associated with Oki Electric Industry Co., Ltd., where he has made significant contributions to semiconductor technology. His work has been instrumental in advancing the methods used in the manufacturing of semiconductor elements.

Collaborations

Mitsumasa has collaborated with notable coworkers, including Yoshio Yamashita and Ryuji Kawazu. Their combined efforts have contributed to the success of various projects within the semiconductor field.

Conclusion

Mitsumasa Kunishi's innovative work in semiconductor technology has made a lasting impact on the industry. His patent for a unique resist showcases his expertise and commitment to advancing technology. His contributions continue to influence the field of semiconductor manufacturing.