Itami, Japan

Mitsuhiro Tomikawa

This inventor holds 2 USPTO granted patents. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuhiro Tomikawa. Retrieved from https://idiyas.com/inventor/mitsuhiro-tomikawa-zmhi6bmn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Itami, JP (1993)
  • Hyogo, JP (1993)

Company Filing History:


Years Active: 1993

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2 patents (USPTO):Explore Patents

Title: Mitsuhiro Tomikawa: Innovator in Semiconductor Technology

Introduction

Mitsuhiro Tomikawa is a prominent inventor based in Itami, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative work focuses on improving the manufacturing processes and performance of semiconductor devices.

Latest Patents

One of his latest patents is a semiconductor device manufacturing apparatus. This apparatus features a heat retaining tube that can be freely placed in and pulled out of a processing chamber. When positioned within the chamber, the heat retaining tube surrounds a boat with semiconductor wafers mounted on it. After the thermal processing is completed, both the heat retaining tube and the semiconductor wafers are extracted together. This design minimizes the temperature difference between the center and periphery of the semiconductor wafer, leading to the production of high-performance semiconductor devices that are free from crystalline defects or dislocations.

Another notable patent is for a stress reduction structure for a resin-sealed semiconductor device. This device includes a semiconductor chip formed on a substrate and sealed with resin. A concave portion is created on the major surface of the semiconductor substrate, positioned between an insulating film for isolation and the edge of the substrate. This concave area is filled with a buffer member that has a lower elastic modulus than the semiconductor substrate material. This design effectively absorbs and reduces mechanical stress applied to the edge of the substrate, ensuring that the integrity of the circuit elements is maintained.

Career Highlights

Mitsuhiro Tomikawa is associated with Mitsubishi Denki Kabushiki Kaisha, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the efficiency and reliability of semiconductor devices.

Collaborations

He has collaborated with notable colleagues such as Yasushi Hashizume and Yuichi Nakashima, contributing to a dynamic and innovative work environment.

Conclusion

Mitsuhiro Tomikawa's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence the development of high-performance semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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