Mitsuhiro Okune

Title: Mitsuhiro Okune: Innovator in Plasma Processing Technology

Introduction

Mitsuhiro Okune is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of plasma processing, holding a total of 5 patents. His innovative work focuses on enhancing the efficiency and effectiveness of plasma processing technologies.

Latest Patents

One of Okune's latest patents is a plasma processing apparatus designed to prevent damage to a cover while minimizing thermal effects on an annular frame. This apparatus includes a chamber with a decompressible internal space, a plasma source for generating plasma, and a stage for placing a carrier. The cover, made from a material with high thermal conductivity, features a protective part that is low-reactive with plasma. Another notable patent involves a method for manufacturing element chips, which allows for the division of a substrate into multiple element chips while ensuring that a protection film is formed only on the side surfaces. This method effectively suppresses the creep-up of conductive materials during the mounting process.

Career Highlights

Throughout his career, Okune has worked with notable companies such as Panasonic Intellectual Property Management Co., Ltd. and Panasonic Corporation. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to various innovative projects.

Collaborations

Okune has collaborated with talented individuals in his field, including Shogo Okita and Mitsuru Hiroshima. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Mitsuhiro Okune's contributions to plasma processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in this field, and his work continues to influence advancements in technology.