The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
May. 28, 2009
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Toshihiro Wada, Osaka, JP;
Mitsuhiro Okune, Osaka, JP;
Mitsuru Hiroshima, Osaka, JP;
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Toshihiro Wada, Osaka, JP;
Mitsuhiro Okune, Osaka, JP;
Mitsuru Hiroshima, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
In a plasma processing apparatus, thrust-up pins are elevated and a thrust-up force is detected when electrostatic attraction for a substrate by a substrate holding device is ceased after completion of plasma processing, the elevation of the thrust-up pins is ceased upon detection of a detection threshold, and a stepped elevating operation in which the elevation and stoppage of the thrust-up pins are repeated a plurality of times are thereafter commenced on condition that the detected thrust-up force falls to or below the detection threshold and that release of the substrate from a placement surface has not been completed. In the stepped elevating operation, operation timing of the thrust-up device is controlled so that the completion of the release of the substrate from the placement surface is detected when the thrust-up pins are stopped after being elevated and so that the stepped elevating operation is continued on condition that the release has not been completed.