Company Filing History:
Years Active: 2015
Title: Mitsuhiro Nabeshima: Innovator in Selective Etching Methods
Introduction
Mitsuhiro Nabeshima is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly through his innovative patent related to selective etching methods. His work has implications for various industries, including electronics and materials engineering.
Latest Patents
Mitsuhiro Nabeshima holds a patent for a selective etching method. This method involves a layer of metal selected from titanium, niobium, tungsten, molybdenum, ruthenium, rhodium, arsenic, aluminum, and gallium. The process also includes an oxide of the metal, a nitride of the metal, silicon nitride, hafnium nitride, tantalum nitride, or an alloy of these metals. The layer is provided on an underlying base material selected from glass, silicon, copper, and nickel. The selective etching is performed using an alkaline etching solution that contains a predefined complexing agent. This innovative approach enhances the precision and efficiency of etching processes.
Career Highlights
Mitsuhiro Nabeshima is associated with JCU Corporation, where he applies his expertise in materials science. His work at the company has allowed him to develop and refine his innovative techniques, contributing to advancements in the field.
Collaborations
Mitsuhiro has collaborated with notable colleagues, including Christopher Cordonier and Shingo Kumagai. These collaborations have fostered a productive environment for innovation and research.
Conclusion
Mitsuhiro Nabeshima's contributions to selective etching methods exemplify his commitment to innovation in materials science. His patent reflects a significant advancement that can impact various technological applications.