This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ulvac, Inc.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Mitsuhiro Endou: Innovator in Plasma Processing Technology
Introduction
Mitsuhiro Endou is a notable inventor based in Susono, Japan. He has made significant contributions to the field of plasma processing technology, particularly through his innovative methods in dry cleaning processes.
Latest Patents
Endou holds a patent for a "Dry cleaning method for plasma processing apparatus." This method involves a vacuum container equipped with a dielectric member, a planar electrode, and a high-frequency antenna. The high-frequency power source supplies energy to both the antenna and the electrode, facilitating the introduction of high-frequency power into the vacuum container. This process generates an inductively-coupled plasma using a gas that includes fluorine. The method effectively removes products containing precious metals and ferroelectrics that adhere to the dielectric member.
Career Highlights
Mitsuhiro Endou is associated with Ulvac, Inc., a company known for its advancements in vacuum technology and plasma processing. His work has been instrumental in enhancing the efficiency and effectiveness of plasma cleaning methods.
Collaborations
Endou has collaborated with notable colleagues such as Masahisa Ueda and Yutaka Kokaze. Their combined expertise has contributed to the development of innovative solutions in the field of plasma processing.
Conclusion
Mitsuhiro Endou's contributions to plasma processing technology through his patented methods highlight his role as an influential inventor. His work continues to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile