Yokohama, Japan

Mitsuhide Aihara

This inventor holds 7 USPTO granted patents and 4 published patent applications and 5 EPO patents. Top assignees: Toyo Kohan Co., Ltd., Toyo Seikan Co., Ltd., Toyo Seikan Kaisha, Ltd.. Active years: 2010-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuhide Aihara. Retrieved from https://idiyas.com/inventor/mitsuhide-aihara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 57.1

 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Kanagawa, JP (2019 - 2021)
  • Yokohama, JP (2010 - 2023)

Company Filing History:


Years Active: 2010-2023

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7 patents (USPTO):Explore Patents

Title: Mitsuhide Aihara - Innovator in Surface Treated Metal Materials

Introduction

Mitsuhide Aihara is an inventor based in Yokohama-shi, Japan. He has made significant contributions to the field of surface-treated metal materials. Although he currently holds no granted patents, his innovative ideas are reflected in his patent applications.

Latest Patent Applications

Aihara's notable patent applications include "Surface Treated Metal Materials," "Method of Treating the Surfaces Thereof," "Resin Coated Metal Materials," and "Cans and Can Lids." These applications describe a surface-treated metal material that features an inorganic surface-treating layer containing inorganic components. This layer may also have an organic surface-treating layer formed on top of it. The inorganic surface-treating layer includes at least one of titanium (Ti), zirconium (Zr), and aluminum (Al), along with oxygen (O) and fluorine (F). The organic surface-treating layer consists of a silane coupling agent with silicon (Si) in an amount ranging from 0.8 to 30 mg/m² or a phenol-type water-soluble organic compound.

Conclusion

Mitsuhide Aihara's work in surface-treated metal materials showcases his innovative spirit and dedication to advancing technology in this area. His patent applications reflect a commitment to developing new materials that could have significant industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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