Omiya, Japan

Mitsuaki Osawa


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Mitsuaki Osawa: Innovator in Semiconductor Technology

Introduction

Mitsuaki Osawa is a notable inventor based in Omiya, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the application of photo resist on semiconductor wafers. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of semiconductor manufacturing processes.

Latest Patents

Mitsuaki Osawa holds a patent for an "Apparatus for applying photo resist on both surfaces of semiconductor." This invention discloses a sophisticated apparatus that comprises a first conveying section for successively conveying semiconductor wafers one by one. It includes a first photo resist application section, a first drying section, a second conveying section, a reversing section, a third conveying section, a second photo resist application section, and a second drying section. This comprehensive design allows for the efficient application of photo resist on both surfaces of a semiconductor wafer, improving the overall manufacturing process.

Career Highlights

Osawa is associated with M. Setek Co., Ltd., where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the company's success but has also positioned him as a key figure in the industry. His dedication to innovation is evident in his patent, which showcases his technical expertise and commitment to improving semiconductor manufacturing.

Collaborations

Mitsuaki Osawa has collaborated with Ritsuo Matsumiya, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of cutting-edge technologies in semiconductor applications.

Conclusion

Mitsuaki Osawa's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work continues to influence the field, paving the way for future innovations in semiconductor manufacturing.

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