Gotenba, Japan

Mithuo Ono

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mithuo Ono. Retrieved from https://idiyas.com/inventor/mithuo-ono

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: The Innovations of Mithuo Ono

Introduction

Mithuo Ono is a notable inventor based in Gotenba, Japan. He has made significant contributions to the field of thermosensitive materials, particularly through his innovative patent. His work is characterized by a commitment to quality and functionality, which has implications for various applications in technology.

Latest Patents

Mithuo Ono holds a patent for a thermosensitive recording material. This material consists of a support and a thermosensitive layer that includes a chromogenic substance, a developing substance, and an inorganic filler primarily made of hexagonal system thin plate type kaolin. This invention not only enables the formation of high-quality images but also prevents abrasion of the thermal head, showcasing its practical advantages.

Career Highlights

Ono is associated with Ricoh Company, Ltd., where he has been able to apply his expertise in developing innovative materials. His work at Ricoh has allowed him to contribute to advancements in imaging technology, enhancing the quality and durability of thermal recording materials.

Collaborations

Mithuo Ono has collaborated with notable colleagues such as Susumu Iwata and Minoru Nomura. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Mithuo Ono's contributions to thermosensitive materials exemplify the intersection of innovation and practicality in technology. His patent reflects a dedication to quality and functionality, making a significant impact in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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