Company Filing History:
Years Active: 1985
Title: Misao Sekimoto: Innovator in Membrane Structures and X-Ray Lithography
Introduction
Misao Sekimoto is a notable inventor based in Yokohama, Japan. He has made significant contributions to the fields of membrane structures and X-ray lithography. With a total of 2 patents, Sekimoto's work showcases his innovative approach to technology and engineering.
Latest Patents
One of Sekimoto's latest patents is a method of fabricating a membrane structure. This process involves forming a thin film over a substrate using a plasma deposition technique that utilizes microwave electron cyclotron resonance. The substrate is then partially removed, leaving a frame that supports the membrane structure. This method allows for the creation of a dense and high-quality membrane at low temperatures, with the internal stress of the membrane being controlled through specific deposition conditions and subsequent heat treatment.
Another significant patent is related to an X-ray lithography mask and the method for fabricating it. In this invention, an X-ray absorber layer made of high melting point metals, such as tantalum (Ta) or tungsten (W), is formed with granular crystal grains on a mask substrate. This design reduces the internal stress of the layer. A fine pattern is created from the absorber layer through reactive sputter etching using CBrF₃ gas as an etchant, resulting in a high-contrast, high-accuracy submicron pattern on the mask substrate.
Career Highlights
Misao Sekimoto is associated with Nippon Telegraph and Telephone Public Corporation, where he has been able to apply his innovative ideas in practical settings. His work has contributed to advancements in technology that are essential for various applications in the industry.
Collaborations
Sekimoto has collaborated with notable colleagues, including Hideo Yoshihara and Akira Ozawa. These partnerships have likely enhanced the quality and impact of his inventions.
Conclusion
Misao Sekimoto's contributions to membrane structures and X-ray lithography demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in meaningful ways.